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Industrial Surface Defect Detection via Diffusion Generation and Asymmetric Student-Teacher Network

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arXiv:2604.19240v1 Announce Type: new Abstract: Industrial surface defect detection often suffers from limited defect samples, severe long-tailed distributions, and difficulties in accurately localizing subtle defects under complex backgrounds. To address these challenges, this paper proposes an unsupervised defect detection method that integrates a Denoising Diffusion Probabilistic Model (DDPM) with an asymmetric teacher-student architecture. First, at the data level, the DDPM is trained solely

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    Computer Science > Artificial Intelligence [Submitted on 21 Apr 2026] Industrial Surface Defect Detection via Diffusion Generation and Asymmetric Student-Teacher Network Shuo Feng, Runlin Zhou, Yuyang Li, Guangcan Liu Industrial surface defect detection often suffers from limited defect samples, severe long-tailed distributions, and difficulties in accurately localizing subtle defects under complex backgrounds. To address these challenges, this paper proposes an unsupervised defect detection method that integrates a Denoising Diffusion Probabilistic Model (DDPM) with an asymmetric teacher-student architecture. First, at the data level, the DDPM is trained solely on normal samples. By introducing constant-variance Gaussian perturbations and Perlin noise-based masks, high-fidelity and physically consistent defect samples along with pixel-level annotations are generated, effectively alleviating the data scarcity problem. Second, at the model level, an asymmetric dual-stream network is constructed. The teacher network provides stable representations of normal features, while the student network reconstructs normal patterns and amplifies discrepancies between normal and anomalous regions. Finally, a joint optimization strategy combining cosine similarity loss and pixel-wise segmentation supervision is adopted to achieve precise localization of subtle defects. Experimental results on the MVTecAD dataset show that the proposed method achieves 98.4\% image-level AUROC and 98.3\% pixel-level AUROC, significantly outperforming existing unsupervised and mainstream deep learning methods. The proposed approach does not require large amounts of real defect samples and enables accurate and robust industrial defect detection and localization. \keywords{Industrial defect detection \and diffusion models \and data generation \and teacher-student architecture \and pixel-level localization} Subjects: Artificial Intelligence (cs.AI) Cite as: arXiv:2604.19240 [cs.AI]   (or arXiv:2604.19240v1 [cs.AI] for this version)   https://doi.org/10.48550/arXiv.2604.19240 Focus to learn more Submission history From: Shuo Feng [view email] [v1] Tue, 21 Apr 2026 08:47:32 UTC (834 KB) Access Paper: HTML (experimental) view license Current browse context: cs.AI < prev   |   next > new | recent | 2026-04 Change to browse by: cs References & Citations NASA ADS Google Scholar Semantic Scholar Export BibTeX Citation Bookmark Bibliographic Tools Bibliographic and Citation Tools Bibliographic Explorer Toggle Bibliographic Explorer (What is the Explorer?) Connected Papers Toggle Connected Papers (What is Connected Papers?) Litmaps Toggle Litmaps (What is Litmaps?) scite.ai Toggle scite Smart Citations (What are Smart Citations?) Code, Data, Media Demos Related Papers About arXivLabs Which authors of this paper are endorsers? | Disable MathJax (What is MathJax?)
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    arXiv AI
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    ◬ AI & Machine Learning
    Published
    Apr 22, 2026
    Archived
    Apr 22, 2026
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